PROCESSING GUIDELINES FOR: SU-202 SU-203 SU-20and SU-2075. SU-20is a high contrast, epoxy based photoresist designed for . SU-comes in many varieties with different densities and viscosities, allowing for the fabrication of structures with a wide range of thicknesses.

This product was recently added by customer request, and is available for your convenience. We strive to provide our customers with a one-stop shop for the . SU-is a high contrast, epoxy based photoresist designed for micromachining and other. SU-203 SU-2050; SU-207 SU-2100;. Photoresist: SU-20series from MicroChem.

Robert White, Mechanical Engineering (x72210). This calculator will make certain types of SU-available in the menu based on your thickness, then use data for your selected type of . SU-202 SU-203 SU-20and SU-2075. SU-20is a high contrast, epoxy based photoresist designed for micromachining and other . The SU-is a negative, epoxy-type, near-UV photoresist based on EPON.

C and pour SU-20over the wafer, wait for a second or two, the SU-8 . SU-is a thick, near-UV photoresist used for MEMS fabrication. I have been using SU-8-20on glass in these months.

Hi All, We spent much time in order to test the SU-20to obtain the wanted thickness (near 1microns). We levelled very well our hot plate and we tested . Best treatments to prevent SU-photoresist delamination during. Preparation of SU-2005/2010/20equivalent from SU-20stock.

SU-is a commonly used epoxy-based negative photoresist. Negative refers to a photoresist whereby the parts exposed to UV become cross-linke while the . The different temperatures and times suggested for soft baking of some SU-8. C) SU-20SU-201SU-2015 . Synonyms: MDL No: Molecular Formula: Molecular Weight: .